Silicon crystals are used as a semiconductor material, high-power transistor, rectifier, solar cells, etc.
Main performance parameters | |||
Crystal structure | face-centered cubic | ||
Melting poingt(℃) | 1420 | ||
Density | 2.4(g/cm3) | ||
Dopant | Undoped | Boron | Phosphorus |
Conduction type | I | P | N |
Resistivity | Ø 1000Ωcm | 10-3~1000Ωcm | 10-3~1000Ωcm |
EPD | ≤100∕cm2 | ≤100∕cm2 | ≤100∕cm2 |
Oxygen content(∕cm3) | ≤1~1.8×1018 | ≤1~1.8×1018 | ≤1~1.8×1018 |
Carbon content(∕cm3) | ≤5×1016 | ≤5×1016 | ≤5×1016 |
Dimension | 5x5mm ,10×10mm、20×20mm, Ø50.8mm, Ø76.2mm, Ø100mm Special direction and size of the substrate can be customized according to the customer need | ||
Thickness | 0.5mm、1.0mm | ||
Dimension tolerance | <±0.1mm | ||
Thickness tolerance | <±0.025mm | ||
Polishing | One side or two sides | ||
Orientation tolerance | ±0.5° | ||
Flat orientation tolerance | 2°(special requirements 1°) | ||
Orientation | <100>、<110>、<111>等 | ||
Packing | Class 100 clean bag, Class 1000 clean room |